For manufacturers of core semiconductor equipment such as etching, thin film deposition, ion implantation, and chemical mechanical polishing (CMP), the core competitiveness of their equipment lies not only in functional implementation but also in three key dimensions: first, the long-term stability of the process; second, high consistency among equipment of the same model; and third, the ability of key parameters to resist drift after long-term operation.

The achievement of these dimensions relies heavily on the accurate acquisition of real current data in key power supply and load circuits—current data is the foundation for closed-loop control and process stability assurance, and high-precision current sensors are the core components for achieving this foundation.